PLASMA THERM 70 SERIES

Double chamber model
PECVD chamber:
         substrate heater maximum temperature: 300 degrees C
         RF 5 maximum power supply: 500 watts
         four separate mass flow controllers
         one manual controller
RIE (Reactive Iron Etch) chamber:
         RF 5 maximum power supply: 500 watts
         four separate mass flow controllers
         one manual mass flow controller